2016-12

2016-12Edit

CALPEK6, 16/12/2016

Wafer batch  from sapienza (380µm, intrinsic, 10 kOhm.cm, DSP, <100>)

• Désoxydation wafer (Hélène, SPEC) 

preparation used 2 times
HF:ODI 1:20, 1'
rinçage ODI 1'

• evap nouveau canon SPEC

Al 14 / Ti 33 / Al 30 -> obtained Tc=805mK
/!\ the machine was in error when I found it, both turbo were stopped, P_ch was ~5e-5mb

Pumped 7h with valve open + N2 trap filled
-> 5.4e-8mb (sas: 9e-8) 
NO ETCH

DEGAS sources
- Al 2nm/s
        goes up to 3e-6 @ Imax
- Ti 0.5nm/s 
        -> Pch = 3.7e-8 / sas = 4.8e-8 gun off
EVAPORATION
- Al 14.5nm @ 0.5nm/s, 0°, spin 16°/s. P_evap = 3.5 / 4.2e-7  ->  1.7/ 1.9e-7 (gun off)
dt = 2'30  
- Ti 33.6nm @ 0.5nm/s, 0°, spin 16°/s. P_evap  = 4.4 / 5.4e-8 ->  3.6/ 4.4e-8 (gun off)
dt = 4'30 (erreur appui sur abort!!!)
- Al 31nm @ 1nm/s, 0°, spin 16°/s. P_evap = 3.2 / 3.6e-7 
charge alu mal fondue!
vent with O2