Sommaire
- 1. Spin curves
datasheets on: http://microchem.com/pdf/PMMA_Data_Sheet.pdf
- Properties:
PMMA positive resists are based on special grades of polymethyl methacrylate designed to provide high contrast, high resolution for e-beam, deep UV (220-250nm) and X-ray lithographic processes. In addition, PMMA is often used as a protective layer in III-V device wafer thinning applications.
We use here 950,000 molecular weights (MW) in the "safe" solvent anisole.
photo (deep UV) / electro sensitive - positive resist (leaves where exposed)
λ/2n= 223 nm (@670nm)
- Developper:
MIB-K + IPA (1:3) for very high resolution, low development rate
MIB-K + IPA (1:2) ...
MIB-K + IPA (1:1) for high resolution, high development rate
MIB-K for low resolution, very high development rate
- Dilution:
solvent: Anisole or A-thinner
- Strip:
- Aceton, >30°C, few minutes
- NMP based removers, 60°C, few 10 minutes
- AR300-70, 60°C, few minutes
Spin curves
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Fichiers 2
| Fichier | Taille | Date | Attaché par | |||
|---|---|---|---|---|---|---|
| PMMA 950K A3 thickness.bmp mesures JD, spin 60s | 688.92 Ko | 12:36, 19 Déc 2011 | Helene_Le_Sueur | Actions | |
 | PMMA_Data_Sheet.pdf Datasheet PMMA | 1168.75 Ko | 11:46, 19 Déc 2011 | Helene_Le_Sueur | Actions | |
| Images 1 | ||
|---|---|---|
 mesures JD, spin 60sPMMA 950K A3 thickness.bmp | ||