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Physol Nano-Fab > Fabrication Databases > Chemicals > Resists
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Resists
ResistsEdit

    e-beam

    PMMA ,  MAA

    UV

    photolithography mask:  AZ , S18
    photosensitive polymers:  BCB  , SU8

    Mixed

    UV3 , MaN ,

    Others

    polymers:  Polyimide ,
    Lift-off layers:  LOR (Lift-Off Resist), PMGI, LOL

    Resist processing tutorial

    The following pdf include general information about the different steps in the resists processing in lithography.

    This one helps you develop a lift-off process

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    Fichiers 3

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    FichierTailleDateAttaché par 
    Adhesion Presentation.ppt Modifier
    Aucune description
    		4.12 Mo19:17, 26 Avr 2010AdminActions
     lift_off_photoresist.pdf
    microchemincals application note on lift-off process with photoresists
    		569.59 Ko17:04, 14 Mai 2013AdminActions
     lithography.pdf
    lithography basics
    		19.56 Mo12:43, 18 Jun 2010Helene_Le_SueurActions
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