Page modifiée à 20:19, 13 Nov 2013 par Vincent_Humbert
Sommaire
Description
4 inches Karl Suss photomask aligner
It uses a 200W non-filtered Hg lamp. The dominant wavelength is 320 nm.
Filters can be added.
single field optical microscope (2 inches field)
suitable for 1" to 4" wafers and small pieces, and wafer thicknesses up to 4 mm.
Lieu: LPN + IEF + SPEC
LPN: Salle SB 7 (yellow clean room), 01 69 63 62 83
SPEC: Clean Room,
IEF: Salle Recherche 2
Responsables
Christophe Roblin, 01 69 63 63 15 (LPN)
Christophe Dupuis, 01 69 63 61 42 (LPN)
Pief Orfila, 01 69 08 73 19 (SPEC)
Jean-René Coudevylle, 01 69 15 78 11 (IEF)
Instructions
Turning ON
- Main power
- Pump
- Push ON / OFF
- wait at least 15 minutes for the lamp to heat up
Default values
| Indicators
|
Menus
- Micro up/down: lift up or down the microscope
- Load wafer: instructions
- Settings:
- Exposure settings: To define the kind of exposure and its duration
- first expo When no alignement is needed
- flood expo When there is no mask
- lamp test When one wants to measure the UV power
- align & expose When alignement is needed
- Wec settings: To load a wafer. Pumps the center holes, blows in the outer hole
- Exposure settings: To define the kind of exposure and its duration
Modes of operation (for first expo and align & expose)
Turning OFF
- Push ON / OFF
- wait 10 minutes for the lamp to heat down
- Main power
- Pump
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Fichiers 3
| Fichier | Taille | Date | Attaché par | |||
|---|---|---|---|---|---|---|
 | Karl Suss MJB-4 manual.pdf Aucune description | 8.72 Mo | 10:51, 13 Oct 2010 | Helene_Le_Sueur | Actions | |
| MJB4 datasheet.pdf Aucune description | 1068.2 Ko | 11:08, 13 Oct 2010 | Helene_Le_Sueur | Actions | |
| MJB4 modes.jpg Aucune description | 498.56 Ko | 11:08, 13 Oct 2010 | Helene_Le_Sueur | Actions | |
| Images 1 | ||
|---|---|---|
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