2013-11

2013-11Edit

QPSLN1

Test doing resonators with optical lithography mask (much faster)
(mask designed together with CPBv1, for increasing litho speed and alignement reliability, and multiplexing several resonators on a single transmission line)

Wafer high resistivity no oxide
HF desox
HF:ODI 1:20, 30"
rinse ODI 30"

Highly cautious about dusts (mount in SPEC clean room in sample holder for evap, then directly go to CSNSM and mount in load lock. Less than 30' outside of vacuum after desox)

1st step: NbSi

- Evap NbSi ( Laurent Louis, CSNSM)
    Nb 185,00 % visé; Nb xx % moyenné sur l'évap.
    15 nm +/- 0.5  @ x 0.2 nm/s

- Résultats RBS (, CSNSM)